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    • 专利摘要:
    A chemically amplified resist composition comprising: a resin which contains an acid unstable moiety, itself insoluble or poorly soluble in an aqueous alkali solution, but becoming soluble in an aqueous alkali solution by action of an acid.
    公开号:BE1018144A3
    申请号:E2007/0614
    申请日:2007-12-21
    公开日:2010-06-01
    发明作者:Kaoru Araki；Satoshi Yamaguchi；Satoshi Yamamoto
    申请人:Sumitomo Chemical Co；
    IPC主号:
    专利说明:

    CHEMICALLY AMPLIFIED RESIST COMPOSITION
    Field of the invention
    The present invention relates to a chemically amplified resist composition. Background of the invention
    A chemically amplified resist composition used for microfabrication of semiconductors employing a lithographic process contains a resin which itself contains a structural unit having a group unstable to acids and which is itself insoluble or poorly soluble in a solution. aqueous solution of alkali, but becomes soluble in an aqueous solution of alkali by action of an acid, and an acid generator comprising a compound generating an acid by irradiation.
    In semiconductor microfabrication, it is desirable to form patterns having high resolution and good line edge roughness and a chemically amplified resist composition is expected to provide these patterns.
    US 2006-0194982 A1 discloses a chemically amplified resist composition containing the salt represented by the general formula:
    wherein E represents a hydrogen atom or a hydroxyl group, and a resin which contains a structural unit having an acid-unstable moiety and which is itself insoluble or poorly soluble in an aqueous alkali solution, but becomes soluble in an aqueous solution of alkali by action of an acid.
    US 2007-27336 A1 discloses a chemically amplified resist composition comprising the salt represented by the following formula:
    and a resin which contains a structural unit having an acid-unstable moiety and which is itself insoluble or poorly soluble in an aqueous alkali solution, but becomes soluble in an aqueous alkali solution by the action of an acid.
    US 2003-0194639 A1 also discloses a chemically amplified resist composition containing the salt represented by the following formula:
    as an acid generator.
    Summary of the invention
    An object of the present invention is to provide a chemically amplified resist composition.
    This and other objects of the present invention will become apparent from the following description.
    The present invention relates to: 1. a chemically amplified resist composition comprising: (A) a salt represented by formula (I):
    In which R21 represents a C1-C30 hydrocarbon group, which may be substituted, and at least one -CH2- group of the hydrocarbon group may be substituted with -CO- or -O-, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A + represents at least one organic cation chosen from a cation represented by the formula (la):
    Cia) in which P1, P2 and P3 each independently represent a C1-C30 alkyl group, which may be substituted by at least one group selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C6 alkoxy group; C12, or a C3-C30 cyclic hydrocarbon group, which may be substituted by at least one group selected from a hydroxyl group and a C1-C12 alkoxy group, a cation represented by the formula (Ib):
    (2b) wherein P4 and P5 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, and a cation represented by the formula (Ic):
    wherein P10, P11, P12, P13, P14, P15, P16, P17, P18, Q ΟΛ Λ1 P, P and P represent. each independently a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, B represents a sulfur or oxygen atom and m represents 0 or 1, (B) a salt, represented by formula (II):
    (II) wherein Q3 represents a C1-C10 perfluoroalkyl group or a C4-C8 perfluoroocycloalkyl group, and A, + represents an organic cation represented by the formula (IIa):
    (IIa) wherein P6 and P7 each independently represent a C1-C12 alkyl group or a C3-C12 cycloalkyl group, wherein P6 and P7 are linked to form a divalent C3-C12 acyclic hydrocarbon group which forms a ring together with the adjacent S + and at least one -CH2- group of the divalent acyclic hydrocarbon group may be substituted with -CO-, -O- or -S-, P8 represents a hydrogen atom, P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted, where P8 and P9 are linked to form a divalent acyclic hydrocarbon group which forms a 2-oxocycloalkyl group together with the -CHCO- adjacent group, and at least one -CH 2 - group of the divalent acyclic hydrocarbon group can be replaced by -CO-, -O- or -S-; and (C) a resin which contains a structural unit having an acid-unstable moiety and which is itself insoluble or poorly soluble in an aqueous alkali solution, but becomes soluble in an aqueous alkali solution by action of a acid; 2. The chemically amplified resist composition according to 1, wherein A + is a cation represented by the formula (Id), (Ic) or (If):
    in which P28, P29 and P30 each individually represent a C1-C20 alkyl group or a C3-C30 cyclic hydrocarbon group, with the exception of a phenyl group, and at least one hydrogen atom of the alkyl group. C1-C20 may be substituted with a hydroxyl group, a C1-C12 alkoxy group or a C3-C12 cyclic hydrocarbon group, and at least one hydrogen atom of the C3-C30 cyclic hydrocarbon group may be substituted with a group hydroxyl, a C1-C12 alkyl group or a C1-C12 alkoxy group, and P31, P32, P33, P34, P35 and P36 are each independently a hydroxyl group, a C1-C12 alkyl group, a C1 alkoxy group -C12 or a C3-C12 cyclic hydrocarbon group, and 1, k, j, i, h and g each independently represent an integer of 0 to 5; 3. The chemically amplified resist composition according to 1, wherein A + is a cation represented by the formula (Ig):
    wherein P41, P42 and P43 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, 4. the chemically amplified resist composition according to 1. wherein A + is a cation represented by the formula (Ih):
    Wherein P22, P23 and P24 each independently represent a hydrogen atom or a C1-C4 alkyl group; the chemically amplified resist composition according to any one of paragraphs 1 to 4, wherein R21 represents a group represented by the formula:
    wherein Z1 represents a single bond where - (0¾) f-, f represents an integer from 1 to 4, Y1 represents -CH2-, -CO- or -CH (OH) -; the ring X1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group, in which a hydrogen atom is substituted by a hydroxyl group at the Y1 position, when Y1 is -CH (OH) -, or in which two hydrogen atoms are substituted by = O at the Y1 position when Y1 is -CO-, and at least one hydrogen atom of the C3-C30 monocyclic or polycyclic hydrocarbon group may be substituted by a C1-C6 alkyl group, a C1-alkoxy group -C6, a C1-C4 perfluoroalkyl group, a group. C1-C6 hydroxyalkyl, a hydroxyl group or a cyano group; 6. chemically amplified resist composition according to 5., wherein the group represented by the formula:
    is a group represented by the formula (1), (m) or (n):
    The chemically amplified resist composition according to 1, wherein A + is a cation represented by the formula (Ih):
    wherein P22, P23 and P24 each independently represent a hydrogen atom or a C1-C4 alkyl group and R21 represents a group represented by the formula:
    wherein Z1 represents a single bond or - (CH2) f-, f represents an integer from 1 to 4, Y1 represents -CH2-, -CO- or -CH (OH) -; the ring X1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group, in which a hydrogen atom is substituted with a hydroxyl group at the Y1 position when Y1 is -CH (OH) - or in which two hydrogen atoms are substituted; by = 0 in the Y1 position when Y1 is -CO-, and at least one hydrogen atom of the C3-C30 monocyclic or polycyclic hydrocarbon group may be substituted by a C1-C6 alkyl group or a C1-C6 alkoxy group; a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; 8. chemically amplified resist composition according to 7, wherein the group represented by the formula:
    is a group represented by the formula (1), (m) or (n):
    9. the chemically amplified resist composition according to any one of paragraphs 1 to 8, wherein Q 1 and Q 2 each independently represent a fluorine atom or a trifluoromethyl group; 10. chemically amplified resist composition according to any one of paragraphs 1 to 8, wherein Q1 and Q2 are fluorine atoms; 11. chemically amplified resist composition according to any one of paragraphs 1 to 10, wherein P6 and P7 are linked to form a divalent C3-C12 hydrocarbon group which forms a ring together with the adjacent S +, P8 represents a hydrogen atom and P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted by at least one group chosen from a C1-C6 alkoxy group, an acyl group; C2-C20 and a nitro group; 12. chemically amplified resist composition according to any one of paragraphs 1 to 10, wherein P6 and. P7 are linked to form a tetramethylene group which forms a ring together with the adjacent S +, P8 represents a hydrogen atom and P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C2-C20 acyl group and a nitro group; 13. chemically amplified resist composition according to any one of paragraphs 1 to 12, wherein Q3 represents a C1-C8 perfluoroalkyl group; 14. The chemically amplified resist composition according to any one of paragraphs 1 to 10, wherein Q3 represents a C1-C8 perfluoroalkyl group, P6 and P7 are linked to form a divalent C3-acyclic hydrocarbon group. C12 which forms a ring together with the adjacent S +, P8 represents a hydrogen atom and P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted by at least one chosen group from a C 1 -C 6 alkoxy group, a C 2 -C 20 acyl group and a nitro group; 15. The chemically amplified resist composition according to any one of paragraphs 1 to 10, wherein Q 3 represents a C 1 -C 8 perfluoroalkyl group, P 6 and P 7 are linked to form a tetramethylene group which forms a ring together with the adjacent S +, P8 represents a hydrogen atom, P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted by at least one group chosen from a C 1 -C 4 alkoxy group; Cö, a C2-C20 acyl group and a nitro group; 16. The chemically amplified resist composition according to paragraph 1, wherein A + is a cation represented by the formula (Ih):
    wherein P22, P23 and P24 each independently represent a hydrogen atom or a C1-C4 alkyl group, and R21 represents a group represented by the formula:
    wherein Z1 represents a single bond or - (CH2) f-, f represents an integer from 1 to 4, Y1 represents -CH2-, -CO- or -CH (OH) -; the ring X1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group, in which a hydrogen atom is substituted with a hydroxyl group at the Y1 position when Y1 is -CH (OH) - or in which two hydrogen atoms are substituted; by = 0 in the Y1 position when Y1 is -CO- and at least one hydrogen atom of the C3-C30 monocyclic or polycyclic hydrocarbon group may be substituted by a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; Q3 represents a C1-C8 perfluoroalkyl group, P6 and P7 are linked to form a divalent C3-C12 acyclic hydrocarbon group which forms a ring together with the adjacent S +, P8 represents a hydrogen atom and P9 represents an alkyl group; C1-C12, a C3-C12 cycloalkyl group or an aromatic group which may be substituted with at least one group chosen from a C1-C6 alkoxy group, a C2-C20 acyl group and a nitro group; 17. chemically amplified resist composition according to any one of paragraphs 1 to 16, wherein the quantitative ratio of the salt represented by formula (I) and the salt represented by formula (II) is 9/1. at 1/9; 18. chemically amplified resist composition according to any one of paragraphs 1 to 17, wherein the resin contains a structural unit derived from a monomer having a bulky acid unstable moiety; 19. the resist composition according to paragraph 18, wherein the bulky acid-labile group is a 2-alkyl-2-adamantyl ester group or a 1- (1-adamantyl) -1-alkylalkyl ester group; 20. The resist composition according to paragraph 18, wherein the monomer having an acid-labile large group is 2-alkyl-2-adamantyl acrylate, 2-alkyl-2-adamantyl methacrylate, acrylate, and the like. 1- (1-adamantyl) -1-alkylalkyl, 1- (1-adamantyl) -1-alkylalkyl methacrylate, 2-alkyl-2-adamantyl 5-norbormene-2-carboxylate, 5-norbormene- 1- (1-adamantyl) -1-alkylalkyl 2-carboxylate, 2-alkyl-2-adamantyl alpha-chloroacrylate or 1 - (1-adamantyl) -1-alkylakyl alpha-chloroacrylate; and 21. the resist composition according to any one of paragraphs 1 to 20, wherein the resist composition further comprises a basic compound.
    Description of Preferred Embodiments
    In the salt represented by formula (I) (hereinafter simply referred to as salt (I)), R21 represents a C1-C30 hydrocarbon group which may be substituted and at least one -CH2- group of the hydrocarbon group may be substituted by -CO-or -O-.
    The C1-C30 hydrocarbon group may be a linear or branched chain hydrocarbon group. The C1-C30 hydrocarbon group may have a monocyclic or polycyclic structure and may have one or more aromatic groups. The C1-C30 hydrocarbon group can have one or two carbon-carbon double bonds.
    It is preferred that the C1-C30 hydrocarbon group has at least one ring structure and it is most preferred that the C1-C30 hydrocarbon group has a ring structure. Examples of the cyclic structure include cyclopropene, cyclohexane, cyclooctane, norbornane, adamantane, cyclohexene, benzene, naphthalene, anthracene, phenanthrene and fluorene structures.
    As examples of the substituent, mention may be made of a C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 1 -C 4 perfluoroalkyl group, a C 1 -C 6 hydroxyalkyl group, a hydroxyl group or a cyano group and the hydroxyl group is preferable as a substituent.
    Examples of the C 1 -C 6 alkyl group are methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl and n-hexyl. Examples of the C 1 -C 6 alkoxy group are methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, sec-butoxy, tert-butoxy, n-pentyloxy and n-hexyloxy. As examples of the perfluoroalkyl group C1-C4, there may be mentioned trifluoromethyl, pentafluoroethyl, heptafluoropropyl and nonafluorobutyl groups. Examples of the C 1 -C 6 hydroxyalkyl group include hydroxymethyl, 2-hydroxyethyl, 3-hydroxypropyl, 4-hydroxybutyl and 6-hydroxyhexyl groups.
    Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group. Examples of the C1-C6 perfluoroalkyl group include trifluoromethyl, pentafluoroethyl, heptafluoropropyl, nonfluorobutyl, undecafluoropentyl and tridecafluorohexyl, and the trifluoromethyl group is preferable.
    It is preferred that Q 1 and Q 2 each independently represent the fluorine atom or the trifluoromethyl group and it is more preferred that Q 1 and Q 2 are the fluorine atoms.
    As specific examples of the anionic part of salt (I), the following can be mentioned:







    It is preferred that R21 represents a group represented by the following formula:
    wherein Z1 represents a single bond or - (CH2) f-, f represents an integer from 1 to 4, Y1 represents -CH2-, -CO- or -CH (OH) -; the ring X1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group, in which a hydrogen atom is substituted with a hydroxyl group at the Y1 position when Y1 is -CH (OH) - or in which two hydrogen atoms are substituted; by = 0 in the Y1 position when Y1 is -CO-, and at least one hydrogen atom in the C3-C30 monocyclic or polycyclic hydrocarbon group may be substituted by a C1-C6 alkyl group, a C1 alkoxy group -C6, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxy group or a cyano group.
    Examples of the C 1 -C 6 alkyl group are methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl and n-hexyl. Examples of the C 1 -C 6 alkoxy group are methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, sec-butoxy, tert-butoxy, n-pentyloxy and n-hexyloxy. Examples of the C 1 -C 6 hydroxyalkyl group include hydroxymethyl, 2-hydroxyethyl, 3-hydroxypropyl, 4-hydroxybutyl and 6-hydroxyhexyl groups.
    Examples of the X 1 ring include a C 4 -C 8 cycloalkyl group, such as one of cyclobutyl, cyclopentyl, cyclohexyl and cyclooctyl, an adamantyl group and a norbornyl group, in which a hydrogen atom may be substituted. by a hydroxyl group or in which two hydrogen atoms may be substituted with = 0, and wherein at least one hydrogen atom may be substituted by the C 1 -C 6 alkyl group, the C 1 -C 6 alkoxy group, the C1-C4 perfluoroalkyl group, the C1-C6 hydroxyalkyl group, the hydroxyl group or the cyano group.
    Specific examples of the X 1 ring include 2-oxocyclopentyl, 2-oxocyclohexyl, 3-oxocyclopentyl, 3-oxocyclohexyl, 4-oxocyclohexyl, 2-hydroxycyclopentyl, 2-hydroxycyclohexyl, 3-hydroxycyclopentyl, 3-hydroxy-2-hydroxycyclopentyl, cyclohexyl, 4-hydroxycyclohexyl, 4-oxo-2-adamantyl, 3-hydroxy-1-adamantyl, 4-hydroxy-1-adamantyl, 5-oxo-norbornan-2-yl, 1,7,7-trimethyl-2- oxonorbornan-2-yl, 3,6,6-trimethyl-2-oxo-bicyclo [3.1.1] heptan-3-yl, 2-hydroxy-norbornan-3-yl, 1,7,7-trimethyl-2- hydroxy-norbornan-3-yl, 3,6,6-trimethyl-2-hydroxybicyclo- [3.1.1] heptan-3-yl.
    etc. (In the above formulas, a straight line with an open end represents a bond which is extended from an adjacent group).
    As cycle X1, the adamantane ring is preferred. The group represented by the following formulas (1), (m) or (n):
    is preferable as group R21. In the above formulas (1), (m) and (n), a straight line with an open end represents a bond which is extended from an adjacent group.
    A + represents at least one organic cation chosen from a cation represented by formula (Ia):
    (la) in which P1, P2 and P3 each independently represent a C1-C30 alkyl group, which may be substituted by at least one group chosen from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-alkoxy group. -C12, or a C3-C30 cyclic hydrocarbon group, which may be substituted by at least one group chosen from a hydroxyl group and a C1-C12 alkoxy group (hereinafter, it will simply be designated by cation (la)) a cation represented by the formula (Ib): (ib). wherein P4 and P5 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group (hereinafter, it will be simply referred to as a cation (Ib)), and a cation represented by the formula (le):
    in which P10, P12, P12, P13, P14, P15, P16, P17, P18,
    Λ Λ Π 21 X
    2 P, P and P each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, B represents a sulfur or oxygen atom and m represents 0 or 1 (later, it will be referred to simply as cation (le)).
    Examples of the C1-C12 alkoxy group in the cations (Ia), (Ib) and (Ic) include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, sec-butoxy, tert butoxy, n-pentyloxy, n-hexyloxy, n-octyloxy and 2-ethylhexyloxy.
    Examples of the C3-C12 cyclic hydrocarbon group in the cation (la) include cyclopentyl, cyclohexyl, 1-adamantyl, 2-adamantyl, phenyl, 2-methylphenyl, 4-methylphenyl, 1-naphthyl and 2- naphthyl.
    As examples of the C 1 -C 30 alkyl group which may be substituted with at least one group chosen from the hydroxyl group, the C 3 -C 12 cyclic hydrocarbon group and the C 1 -C 12 alkoxy group in the cation (la), mention may be made of methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, n-hexyl, n-octyl, 2-ethylhexyl and benzyl groups.
    As examples of the C 1 -C 30 alkyl group, which may be substituted with at least one group chosen from hydroxyl group, the C 3 -C 12 cyclic hydrocarbon group and the C 1 -C 12 alkoxy group in the cation (la), it is possible to mention the methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, n-hexyl, n-octyl, 2-ethylhexyl and benzyl groups.
    As examples of the C3-C30 cyclic hydrocarbon group which may be substituted by at least one group selected from hydroxyl group and the C1-C12 alkoxy group in the cation (la), there may be mentioned a cyclopentyl, cyclohexyl, adamantyl, 2-adamantyl, bicyclohexyl, phenyl, 2-methylphenyl, 4-methylphenyl, 4-ethylphenyl, 4-isopropylphenyl, 4-tert-butylphenyl, 2,4-dimethylphenyl, 2,4,6-trimethylphenyl, 4- n-hexylphenyl, 4-n-octylphenyl, 1-naphthyl, 2-naphthyl, fluorenyl, 4-phenylphenyl, 4-hydroxyphenyl, 4-methoxyphenyl, 4-tert-butoxyphenyl and 4-n-hexyloxyphenyl.
    Examples of the C1-C12 alkyl group in the cations (Ib) and (Ic) include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n -pentyl, n-hexyl, n-octyl and 2-ethylhexyl.
    Examples of the cation (la) include the following:

    Examples of the cation (Ib) include the following:
    Examples of the cation (le) include the following:


    As the organic cation represented by A +, the cation (Ia) is preferable.
    As organic cation represented by A +, the cations represented by the following formulas (Id), (Ic) and (If):
    in which P28, P29 and P30 each independently represent a C1-C20 alkyl group or a C3-C30 cyclic hydrocarbon group, with the exception of a phenyl group, and at least one hydrogen atom of the C1-alkyl group. -C20 may be substituted with a hydroxyl group, a C1-C12 alkoxy group or a C3-C12 cyclic hydrocarbon group and at least one hydrogen atom of the C3-C30 cyclic hydrocarbon group may be substituted by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, and P31, P32, P33, P34, P35 and P36 each independently represent a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group; or a C3-C12 cyclic hydrocarbon group, and 1, k, j, i, h and g each independently represent an integer from 0 to 5, are also preferable.
    Examples of the C 1 -C 20 alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, tert-butyl, n-hexyl, n-octyl, n-decyl and n-eicosyl groups.
    As examples of the C1-C12 alkoxy group and the C3-C30 cyclic hydrocarbon group, mention may be made of the same groups as those mentioned above.
    As an organic cation represented by A +, a cation represented by the formula (Ig):
    (Ig) wherein P41, P42 and P43 each independently represent a hydrogen atom, a hydroxy group, a C1-C12 alkyl group or a C1-C12 alkoxy group, is clearly preferred and a cation represented by the formula ( Ih):
    (1h) wherein P22, P23 and P24 each independently represent a hydrogen atom or a C1-C4 alkyl group is particularly preferable.
    As an example of the. alkyl group and the alkoxy group, there may be mentioned the same groups as those mentioned above.
    As salt (I), the salt represented by the following formula:
    in which A +, Q1, Q2, X1, Y1 and Z1 are the same as defined above, is preferable and the salt represented by the following formula:
    in which P22, P23, P24, Q1, Q2, X1, Y1 and Z1 are the same as defined above, is clearly preferable and the salts represented by the following formulas:
    in which P22, P23, P24, Q1 and Q2. are the same as defined above, are particularly preferable.
    In the salt represented by the formula (II) (hereinafter simply referred to as salt (II)), Q3 represents a C1-C10 perfluoroalkyl group or a C4-C8 perfluoroocycloalkyl group, and Q3 preferably represents the C1-C10 perfluoroalkyl group.
    As examples of the perfluoroalkyl group Ci-Cio, there may be mentioned trifluoromethyl, pentafluoroethyl, heptafluoropropyl, nonafluorobutyl, tetradecafluorohexyl and heptadecafluorooptyl groups.
    Examples of the C 4 -C 8 perfluoro-cycloalkyl group include perfluorocyclohexyl and perfluoro-4-ethylcyclohexyl groups.
    As specific examples of the anionic part of salt (II), the following can be mentioned:
    A '+ represents an organic cation represented by the formula (IIa):
    (IIa) wherein P6 and P7 each independently represent a C1-C12 alkyl group or a C3-C12 cycloalkyl group, wherein P6 and P7 are linked to form a divalent C3-C12 acyclic hydrocarbon group which forms a ring together with the adjacent S +, and at least one -CH 2 - of the divalent acyclic hydrocarbon group may be substituted with -CO-, -O- or -S-; P8 represents a hydrogen atom, P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted, where P8 and P9 are linked to form a divalent acyclic hydrocarbon group which forms a 2-oxocycloalkyl group together with the adjacent -CHCO-, and at least one -CH2- of the divalent acyclic hydrocarbon group can be replaced by -CO-, -O- or -S- (which will be subsequently called simply cation (IIa)).
    Examples of the C1-C12 alkyl group include the same groups as mentioned above.
    Examples of the C 3 -C 12 cycloalkyl group in the cation (IIa) include cyclopropyl, cyclobutyl, cyclopentyl, cycloheptyl, cyclooctyl and cyclodecyl groups. Examples of the divalent C3-C12 acyclic hydrocarbon group formed by linking P6 and P7 include trimethylene, tetramethylene or pentamethylene groups. Examples of the cyclic group formed together with the adjacent S + and the divalent acyclic hydrocarbon group include tetramethylenesulphonic, pentamethylenesulphonic and oxybisethylenesulphonic groups.
    Examples of the aromatic group of the cation (IIa) include phenyl, tolyl, xylyl, 4-n-butylphenyl, 4-isobutylphenyl, 4-tert-butylphenyl, 4-cyclohexylphenyl, 4-phenylphenyl and naphthyl. The aromatic group may be substituted and the examples of the substituents include a C1-C6 alkoxy group, such as methoxy, ethoxy, n-propoxy, n-butoxy, tert-butoxy and n-hexyloxy; a C2-C12 acyloxy group such as an acetyloxy group and a 1-adamantylcarbonyl group; and a nitro group.
    As P9, the aromatic group is preferred.
    Examples of the divalent acyclic hydrocarbon group formed by the bonding of P8 and P9 include methylene, ethylene, trimethylene, tetramethylene and pentamethylene. It is preferred that the divalent acyclic hydrocarbon group formed by linking P8 and P9 is the tetramethylene moiety. As examples of the 2-oxocycloalkyl group formed together with the adjacent -CHCO- and the divalent acyclic hydrocarbon group, there may be mentioned a 2-oxocyclopentyl or 2-oxocyclohexyl moiety.
    As the cation (IIa), the cation in which P6 and P7 are linked to form the divalent C3-C12 acyclic hydrocarbon group to form the ring together with the adjacent S +, P5 represents the hydrogen atom and P9 represents the alkyl group C1-C12, the C3-C12 cycloalkyl group or the aromatic group, which may be substituted by at least one group chosen from the C1-C6 alkoxy group, the C2-C20 acyl group and the nitro group is preferable, and the cation, wherein P6 and P7 are linked to form the trimethylene, tetramethylene or pentamethylene moiety, which form the ring together with the adjacent S +, P8 represents the hydrogen atom and P9 represents the C1-C12 alkyl group or the aromatic group which may be substituted by at least one group chosen from the C 1 -C 6 alkoxy group and the nitro group, is clearly preferable, and the cation in which P 6 and P 7 are linked for forming the tetramethylene group which forms the ring together with the adjacent S +, P8 represents the hydrogen atom and P9 represents the C1-C12 alkyl group or the aromatic group which may be substituted by at least one group chosen from the alkoxy group C 1 -C 6 and the nitro group is particularly preferable.
    Examples of the cation (IIa) include the following:

    As salt (II), the salt represented by the following formula:
    in which P6, P7, P8 and P9 are the same as defined above, is clearly preferable, and the salts represented by the following formulas:
    in which P9 is the same as defined above, are particularly preferable.
    The salt (I) can be produced by a process comprising the reaction of a salt of formula (LI):
    In which M is Li, Na, K or Ag, and Q1, Q2 and R have the same meanings as defined above (hereinafter referred to simply as salt (LI)), with a compound of formula (XI):
    (XI) wherein A + has the same meaning as defined above, and G represents F, Cl, Br, I, Bf4, AsF0, SbF6, PF6 or C104 (hereinafter simply referred to as compound (XI)).
    The reaction of the salt (LI) and the compound (XI) is usually carried out in an inert solvent, such as acetonitrile, water, methanol and dichloromethane, at a temperature of about 0.degree. To 150.degree. preferably from 0 to 100 ° C, with stirring.
    The amount of the compound (XI) is usually from 0.5 to 2 moles per mole of the salt (LI). The salt (I) obtained by the process above can be isolated by recrystallization and can be purified by washing with water.
    The salt (LI) used for the production of the salt (I) can be produced by a process comprising the esterification of an alcohol compound represented by the formula (LU):
    (LU) in which R21 has the same meaning as that defined above (which will be called simply afterwards composed of alcohol (LU)), with a carboxylic acid represented by the formula (IX): (IX) in which M, Q1 and Q2 have the same meanings as those defined above (and which will be called hereinafter simply carboxylic acid (IX)).
    The esterification reaction of the alcohol compound (LU) and the carboxylic acid (IX) can generally be carried out by mixing materials in an aprotic solvent, such as dichloroethane, toluene, ethylbenzene, monochlorobenzene, acetonitrile and N, N-dimethylformamide at 20 to 200 ° C, preferably at 50 to 150 ° C. In the esterification reaction, an acid catalyst or a dehydrating agent is usually added and, as examples of the acid catalyst, organic acids, such as p-toluenesulfonic acid, and inorganic acids, such as 'sulfuric acid. Examples of the dehydrating agent include 1,1'-carbonyldiimidazole and N, N'-dicyclohexylcarbodiimide.
    The esterification reaction can preferably be carried out under dehydration because the reaction time tends to be shortened. As an example of the dehydration process, mention may be made of the Dean and Stark process.
    The amount of carboxylic acid (IX) is usually 0.2 to 3 moles, preferably 0.5 to 2 moles per mole of the alcohol compound (LU).
    The amount of acid catalyst may be a catalytic amount or an amount equivalent to that of a solvent and is usually from 0.001 to 5 moles per mole of alcohol compound (LU). The amount of dehydrating agent is usually 0.2 to 5 moles, preferably 0.5 to 3 moles per mole of alcohol compound (LU).
    The salt (II) can be produced by a process comprising the reaction of a salt of formula (III): M, + O3S-Q3 (III) in which M 'represents A, Li, Na, K or Ag and Q3 a the same meanings as those defined above (and which will be hereinafter referred to simply as salt (III)), with a compound of formula (XII): A, + "<5 '(XII) in which A' + has the same meaning as defined above and G 'represents F, Cl, Br, I, BF4, AsF6, SbF6, PF6 or C104 (and which will be hereinafter simply referred to as compound (XII)).
    The reaction of the salt (III) and the compound (XII) is usually carried out in an inert solvent, such as acetonitrile, water, methanol and dichloromethane at a temperature of about 0 to 150 ° C, preferably from 0 to 100 ° C, with stirring.
    The amount of the compound (XII) is usually from 0.5 to 2 moles per mole of the salt (LUI). The salt (II) obtained by the above process can be isolated by recrystallization and can be purified by washing with water.
    The present resist composition comprises (A) salt (I), (B) salt (II) and (C) a resin which contains a structural unit having a group unstable to acids and which itself is insoluble or poorly soluble in an aqueous solution of alkali, but becomes soluble in an aqueous solution of alkali by the action of an acid.
    The salt (I) and the salt (II) are usually used as acid generators and the acid generated by irradiation of the salt (I) and salt (II) acts catalytically against unstable acid groups of the resin, cleave the groups unstable to acids and the resin becomes soluble in an aqueous solution of alkali.
    The resin used for the present composition contains a structural unit having the acid-unstable moiety and which is itself insoluble or poorly soluble in an aqueous alkali solution, but the acid-unstable moiety is cleaved with an acid.
    In the present specification, the term "COOR" may be described as "a structure having a carboxylic acid ester" and may also be abbreviated to "ester group". Specifically, "-COOC (CH 3) 3" may be described as a "structure having a carboxylic acid tert-butyl ester" or may be abbreviated to "tert-butyl ester moiety".
    Examples of the acid-unstable moiety include a structure having a carboxylic acid ester, such as an alkyl ester group, wherein a carbon atom adjacent to the oxygen atom is a carbon atom quaternary, a bicyclic ester group in which a carbon atom adjacent to the oxygen atom is a quaternary carbon atom and a lactone ester group, wherein a carbon atom adjacent to the oxygen atom is a quaternary carbon atom. "Quaternary carbon atom" refers to a "carbon atom joined to four substituents other than a hydrogen atom". As unstable acid groups, there may be exemplified a group having a quaternary carbon atom joined to three carbon atoms and a group -OR ', where R' represents an alkyl group.
    As examples of the acid-unstable group, there may be mentioned an alkyl ester group, wherein a carbon atom adjacent to the oxygen atom is a quaternary carbon atom, especially a tert-butyl ester group; an ester group of the acetal type, such as a methoxymethyl ester, an ethoxymethyl ester, a 1-ethoxyethyl ester, a 1-isobutoxyethyl ester, a 1-isopropoxyethyl ester or a 1-ethoxypropoxy ester; , a 1- (2-methoxyethoxy) ethyl ester, a 1- (2-methoxyethoxy) ethyl ester, a 1- [2- (1-adamantyloxy) ethoxy] ethyl ester, a 1- [2- (2-methoxyethoxy) ethyl ester, 1- (adamantanocarboxyloxy) ethoxy] ethyl, a tetrahydro-2-furyl ester and a tetrahydro-2-pyranyl ester; an alicyclic ester group, in which a carbon atom adjacent to the oxygen atom is a quaternary carbon atom, in particular an isobornyl ester, a 1-alkylcycloalkyl ester or a 2-alkyl-2-adamantyl ester; and a 1- (1-adamantyl) -1-alkylalkyl ester group. At least one hydrogen atom of the adamantyl group may be substituted by a hydroxyl group.
    As examples of the structural unit, there may be mentioned a structural unit derived from an acrylic acid ester, a structural unit derived from a methacrylic acid ester, a structural unit derived from a norbornenecarboxylic acid ester, a structural unit derived from a tricyclododecenecarboxylic acid ester and a structural unit derived from a tetracyclodecene carboxylic acid ester. The structural units derived from the acrylic acid ester and the methacrylic acid ester are preferable.
    The resin used for the present composition can be obtained by carrying out a polymerization reaction of one or more monomers having the acid-unstable group and an olefinic double bond.
    Among the monomers, those having an unstable group with bulky acids, in particular an alicyclic ester group (for example, a 2-alkyl-2-adamantyl ester group and a 1- (1-adamantyl) -1-alkylalkyl ester group) are preferable because an excellent resolution is obtained with the resulting resin used in the present composition.
    Examples of such a monomer containing the bulky acid unstable moiety include 2-alkyl-2-adamantyl acrylate, 2-alkyl-2-adamantyl methacrylate, 1- (1- adamantyl) -1-alkylalkyl, 1- (1-adamantyl) -1-alkylalkyl methacrylate, 2-alkyl-2-adamantyl-5-norbornene-2-carboxylate, 1- (1-adamantyl) -1- alkyl-alkyl-5-norbornene-2-carboxylate, 2-alkyl-2-adamantyl alpha-chloroacrylate and 1- (1-adamantyl) -1-alkylalkyl alpha-chloroacrylate.
    Especially when 2-alkyl-2-adamantyl acrylate, 2-alkyl-2-adamantyl methacrylate or 2-alkyl-2-adamantyl alpha-chloroacrylate is used as the monomer for the resin component in the present invention. composition, there is a tendency to obtain a resist composition of excellent resolution. Typical examples include 2-methyl-2-adamantyl acrylate, 2-methyl-2-adamantyl methacrylate, 2-ethyl-2-adamantyl acrylate, 2-ethyl-2-methacrylate, and the like. adamantyl, 2-n-butyl-2-adamantyl acrylate, 2-methyl-2-adamantyl alpha-chloroacrylate and 2-ethyl-2-adamantyl alpha-chloroacrylate. Particularly when 2-ethyl-2-adamantyl acrylate, 2-ethyl-2-adamantyl methacrylate, 2-isopropyl-2-adamantyl acrylate or methacrylate are used for the present composition. of 2-isopropyl-2-adamantyl, there is a tendency to obtain a resist composition of excellent sensitivity and excellent heat resistance. In the present invention, two or more types of monomers having acid-disrupted group (s) may be used together, if necessary.
    The 2-alkyl-2-adamantyl acrylate may be usually produced by reacting a 2-alkyl-2-adamantanol or a metal salt thereof with an acrylic halide, and the 2-alkyl-2-adamantyl methacrylate may be usually produced by reacting a 2-alkyl-2-adamantanol or a metal salt thereof with a methacrylic halide.
    The resin used for the present composition may also contain one or more other structural units derived from an acid stable monomer in addition to the aforementioned structural units which have an acid unstable moiety. In the present application, "structural unit derived from acid-stable monomer" refers to "a non-dissociated structural unit of an acid generated by salt (I) and salt (II)".
    Examples of this other structural unit derived from the acid-stable monomer include a structural unit derived from a monomer having a free carboxyl group, such as acrylic acid and methacrylic acid; a structural unit derived from an unsaturated aliphatic dicarboxylic anhydride, such as maleic anhydride and itaconic anhydride; a structural unit derived from 2-norbornene; a structural unit derived from acrylonitrile or methacrylonitrile; a structural unit derived from an alkyl acrylate or alkyl methacrylate, wherein a carbon atom adjacent to the oxygen atom is a secondary or tertiary carbon atom; a structural unit derived from 1-adamantyl acrylate or 1-adamantyl methacrylate; a structural unit derived from styrene monomer, such as p-hydroxystyrene and m-hydroxystyrene; a structural unit derived from acryloyloxy-γ-butyrolactone or methacryloyloxy-γ-butyrolactone having a lactone ring which may be substituted with an alkyl group; etc. Here, the 1-adamantyloxycarbonyl group is the acid stable group although the carbon atom adjacent to the oxygen atom is the quaternary carbon atom, and the 1-adamantyloxycarbonyl group may be substituted by at least one a hydroxyl group.
    As specific examples of the structural unit derived from the acid-stable monomer, there may be mentioned: a structural unit derived from 3-hydroxy-1-adamantyl acrylate; a structural unit derived from 3-hydroxy-1-adamantyl methacrylate; a structural unit derived from 3,5-dihydroxy-1-adamantyl acrylate; a structural unit derived from 3,5-dihydroxy-1-adamantyl methacrylate; a structural unit derived from alpha-acryloyloxy-γ-butyrolactone; a structural unit derived from alpha-methacryloyloxy-γ-butyrolactone; a structural unit derived from β-acryloyloxy-γ-butyrolactone; a structural unit derived from β-methacryloyloxy-γ-butyrolactone; a structural unit represented by formula (1):
    U) wherein R1 represents a hydrogen atom or a methyl group, R3 represents a methyl group, a trifluoromethyl group or a halogen atom, e represents an integer from 0 to 3 and, when f represents 2 or 3, the groups R2 may be identical or different from each other; a structural unit represented by formula (2):
    (2) wherein R2 represents a hydrogen atom or a methyl group, R4 represents a methyl group, a trifluoromethyl group or a halogen atom, d represents an integer of 0 to 3 and, when e represents 2 or 3, the groups R4 may be identical or different from each other; a structural unit derived from p-hydroxystyrene; a structural unit derived from m-hydroxystyrene; a structural unit derived from an alicyclic compound having an olefinic double bond, such as a structural unit represented by the formula (3):
    (3) wherein R5 and R6 each independently represent a hydrogen atom, a C1-C3 alkyl group, a C1-C3 hydroxyalkyl group, a carboxy group, a cyano group, a hydroxyl group or a group -COO- in which U represents an alcohol residue, where R 5 and R 6 may be bonded to one another to form a carboxylic anhydride residue represented by -C (= O (OC) (= O) -; structural unit derived from an unsaturated aliphatic carboxylic anhydride, such as a structural unit represented by formula (4):
    <4) 9 a structural unit represented by the formula (5):
    (5) "9 etc.
    In particular, the resin also having at least one structural unit selected from the structural unit derived from p-hydroxystyrene, the structural unit derived from m-hydroxystyrene, the structural unit derived from 3-hydroxy-1-acrylate. adamantyl, the structural unit derived from 3-hydroxy-1-adamantyl methacrylate, the structural unit derived from 3,5-dihydroxy-1-adamantyl acrylate, the structural unit derived from 3,5-dihydroxy methacrylate 1-adamantyl, the structural unit represented by formula (1) and the structural unit represented by formula (2) in addition to the structural unit having the acid-unstable moiety is preferable from the standpoint of adhesiveness of the resist to a substrate and the resolution of the resist.
    3-hydroxy-1-adamantyl acrylate, 3-hydroxy-1-adamantyl methacrylate, 3,5-dihydroxy-1-adamantyl acrylate and 3,5-dihydroxy-1-adamantyl methacrylate may in the same way be produced, for example, by reacting the corresponding hydroxy-adamantane with acrylic acid, methacrylic acid or its acid halide, and they are also commercially available.
    On the other hand, the acryloyloxy-γ-butyrolactone and the methacryloyloxy-γ-butyrolactone having the lactone ring, which may be substituted by the alkyl group, may be produced by reacting α- or β-bromo-γ- corresponding butyrolactone with acrylic acid or methacrylic acid, or by reacting the corresponding α- or β-hydroxy-γ-butyrolactone with the acrylic halide or methacrylic halide.
    As monomers to give structural units represented by the formulas (1) and (2), in particular, there may be mentioned, for example, an alicyclic lactone acrylate and a methacrylate of alicyclic lactones having the hydroxyl group described above, and their mixtures. These esters may be produced, for example, by reacting the corresponding alicyclic lactone having the hydroxyl group with acrylic acid or methacrylic acid and its production method is described, for example, in JP 2000-26446. AT.
    Examples of the lactone ring acryloyloxy-y-butyrolactone and methacryloyloxy-y-butyrolactone, which may be substituted by the alkyl group, include: α-acryloyloxy-γ-butyrolactone, α-acryloyloxy-γ-butyrolactone, methacryloyloxy-γ-butyrolactone, α-acryloyloxy-β, β-dimethyl-γ-butyrolactone, α-methacryloyloxy-β, β-dimethyl-γ-butyrolactone, α-acryloyloxy-α-methyl-y- butyrolactone, 1'-α-methacryloyloxy-α-methyl-γ-butyrolactone, β-acryloyloxy-γ-butyrolactone, β-methacryloyloxy-γ-butyrolactone and β-methacryloyloxy-α-methyl-γ-butyrolactone.
    The resin containing a structural unit derived from 2-norbornene has a strong structure because the alicyclic group is directly present on its main chain and has this property that the resistance to dry etching is excellent. The structural unit derived from 2-norbornene can be introduced into the main chain by radical polymerization using, for example, an unsaturated aliphatic dicarboxylic anhydride, such as maleic anhydride and itaconic anhydride, together with 2-norbornene. corresponding. The structural unit derived from 2-norbornene is formed by opening its double bond and can be represented by the above formula (3). The structural units derived from maleic anhydride and itaconic anhydride, i.e. structural units derived from unsaturated aliphatic dicarboxylic anhydrides, are formed by opening their double bonds and may be represented by the formula ( 4) and formula (5), respectively.
    In R 5 and R 6, examples of the C 1 -C 3 alkyl group include methyl, ethyl and n-propyl groups, and examples of the C 1 -C 3 hydroxyalkyl group include hydroxymethyl and 2-hydroxyethyl groups.
    In R 5 and R 6, the -COO 2 - group is an ester formed from the carboxyl group and, as the alcohol residue corresponding to U, for example, there will be mentioned an optionally substituted C 1 -C 6 alkyl group, a 2-oxooxolane group. -3-yl, a 2-oxooxolan-4-yl group, etc., and, as a substituent on the C1-C8 alkyl group, there will be mentioned a hydroxyl group, an alicyclic hydrocarbon residue, etc.
    Specific examples of the monomer used to give the structural unit represented by the above-mentioned formula (3) may include 2-norbornene, 2-norbornene, 2-hydroxy-5-norbornene, 5-norbornene-2-acid and the like. carboxylic acid, methyl 5-norbornene-2-carboxylate, 2-hydroxyethyl 5-norbornene-2-carboxylate, 5-norbornene-2-methanol and 5-norbornene-2,3-dicarboxylic anhydride.
    When U of the -COO- group is the acid-unstable moiety, the structural unit represented by formula (3) is a structural unit having the acid-unstable moiety, even if it has the norbornane structure. Examples of monomers giving a structural unit having the acid-unstable moiety include tert-butyl 5-norbornene-2-carboxylate, 1-cyclohexyl-1-methyl-ethyl 5-norbornene-2-carboxylate, 1-methylcyclohexyl 5-norbornene-2-carboxylate, 2-methyl-2-adamantyl 5-norbornene-2-carboxylate, 2-ethyl-2-adamantyl 5-norbornene-2-carboxylate, 1- (4-methylcyclohexyl) -1-methylethyl 5-norbornene-2-carboxylate, 1- (4-hydroxylcyclohexyl) -1-methylethyl 5-norbornene-2-carboxylate, 5-norbornene-2-carboxylate 1-methyl-1- (4-oxocyclohexyl) ethyl, 1- (1-adamantyl) -1-methylethyl-5-norbornene-2-carboxylate, etc .;
    The resin used in the present composition preferably contains the structural unit (s) having the acid-unstable moiety generally in a ratio of 10 to 80% per mole in all structural units of the resin, although the ratio varies depending on the type. of radiation for the configuration exposure, the type of unstable acid grouping, etc.
    When structural units particularly derived from 2-alkyl-2-adamantyl acrylate, 2-alkyl-2-adamantyl methacrylate, 1- (1-adamantyl) -1-alkylalkyl acrylate or methacrylate 1- (1-adamantyl) -1-alkylalkyl are used as the structural unit having the acid-unstable moiety, it is advantageous for the resistance to dry etching of the resist that the ratio of the structural units is 15% per mole or more in all the structural units of the resin.
    When, in addition to the structural units having the acid-unstable moiety, other structural units having the acid-stable moiety are contained in the resin, it is preferred that the sum of these structural units is in the range of 20 to 90% per mole with respect to all the structural units of the resin.
    In the case of KrF lithography, even in the case of the use of a structural unit derived from hydroxystyrene, especially p-hydroxy-styrene and m-hydroxystyrene, as one of the components of the resin a resin composition having sufficient transparency can be obtained. To obtain these resins, the corresponding acrylic or methacrylic ester monomer can be radically polymerized with acetoxystyrene and styrene, and then the acetoxy group of the structural unit derived from acetoxystyrene can be deacetylated with an acid.
    Specific examples of the structural unit derived from hydroxystyrene include the following structural units represented by formulas (6) and (7):
    The resin used for the present resist composition can be produced by carrying out the polymerization reaction of the corresponding monomer (s). The resin can also be produced by carrying out the oligomerization reduction of the corresponding monomer (s) followed by the polymerization of the oligomer obtained.
    The polymerization reaction is usually carried out in the presence of a radical initiator.
    The radical initiator is not limited and these examples include an azo compound, such as 2,2'-azobisisobutyronitrile, 2,2'-azobis (2-methylbutyronitrile), 1,1'-azobis (cyclohexane) -1-carbonitrile), 2,2'-azobis (2,4-dimethyl-valeronitrile), 2,2'-azobis (2,4-dimethyl-4-methoxy-valeronitrile), dimethyl-2,2 azobis (2-methyl-propionate) and 2,2'-azobis (2-hydroxymethyl-propionitrile); an organic hydroperoxide, such as lauroyl peroxide, tert-butyl hydroperoxide, benzoyl peroxide, tert-butyl peroxybenzoate, cumene hydroperoxide, diisopropyl peroxy dicarbonate, 1-n peroxydicarbonate; propyl, tert-butyl peroxneodecanoate, tert-butyl peroxypivalate and 3,5,5-trimethylhexanoyl peroxide; and an inorganic peroxide, such as potassium peroxodisulfate, ammonium peroxodisulfate and hydrogen peroxide. Of these, the azo compound is preferable and 2,2'-azobisisobutylonitrile, 2,2'-azobis (2-methyl-butyronitrile), 1,1'-azobis (cyclohexane-1-carbonitrile), 2,2'-azobis (2,4-dimethyl-valeronitrile) and dimethyl-2,2'-azobis (methyl-propionate) are clearly preferable, and 2,2'-azobisisobutyronitrile and 2,2'-azobis (2,4-dimethylvaleronitrile) are particularly preferable.
    These radical initiators may be used alone or in the form of a mixture of two or more types of them. When using the mixture of two or more kinds of them, the mixed ratio is not particularly limited.
    The amount of radical initiator is preferably from 1 to 20% by mole based on the molar amount of all monomers or oligomers.
    The polymerization temperature is usually 0 to 150 ° C, preferably 40 to 100 ° C.
    The polymerization reaction is usually carried out in the presence of a solvent and it is preferred to use a solvent which is sufficient to dissolve the monomer, the radical initiator and the resulting resin. As examples, there may be mentioned a hydrocarbon solvent, such as toluene; an ether solvent, such as 1,4-dioxane and tetrahydrofuran; a ketone solvent, such as methyl isobutyl ketone; an alcohol-type solvent, such as isopropyl alcohol; a cyclic ester type solvent, such as γ-butyrolactone; a glycol ether ester solvent, such as propylene glycol monomethyl ether acetate; and an acrylic ester solvent, such as ethyl lactate. These solvents can be used alone or one of their mixtures can also be used.
    The amount of solvent is not limited and will preferably be from 1 to 5 parts by weight based on 1 part of all the monomers or oligomers.
    When an alicyclic compound having an olefinic double bond and an unsaturated aliphatic dicarboxylic anhydride are used as monomers, it is preferred to use them in excess amount because of their tendency not to readily polymerize.
    After conclusion of the polymerization reaction, the resin produced can be isolated, for example, by adding a solvent, wherein the present resin is insoluble or poorly soluble in the resulting reaction mixture and filtering the precipitated resin. If necessary, the isolated resin can be purified, for example, by washing with a suitable solvent.
    The present resist composition preferably comprises 80 to 99.9% by weight of the resin component and 0.1 to 20% by weight of the sum of the salt (I) and salt (II) based on the total amount. resin component, salt (I) and salt (II).
    The quantitative ratio of salt (I) and salt (II) is usually 9/1 to 1/9, preferably 8/2 to 3/7, more preferably 8/2 to 4/6.
    In the present resist composition, the performance degradation caused by acid inactivation that occurs due to the post-exposure delay can be decreased by adding an organic base compound, particularly an organic base compound containing nitrogen, as an extinguishing agent.
    Specific examples of the nitrogen-containing organic base compound include an amine compound represented by the following formulas:
    in which R 11 and R 12 independently represent a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group, and the alkyl, cycloalkyl and aryl groups may be substituted by at least one group chosen from a hydroxyl group, a an amino group which may be substituted by a C1-C4 alkyl group and a C1-C6 alkoxy group which may be substituted by a C1-C6 alkoxy group, R13 and R14 independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an alkoxy group, and the alkyl, cycloalkyl, aryl and alkoxy groups may be substituted by at least one group chosen from a hydroxyl group, an amino group which may be substituted by a C1-C6 alkyl group. C4 and a C1-C6 alkoxy group, where R13 and R14 bind together with the carbon atoms to which they are bound.to form a cyc the aromatic, R15 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkoxy group or a nitro group, and the alkyl, cycloalkyl, aryl and alkoxy groups which may be substituted by at least one group selected from a hydroxyl group, an amino group which may be substituted by a C1-C4 alkyl group and a C1-C6 alkoxy group, R represents an alkyl or cycloalkyl group and the alkyl and cycloalkyl groups may be substituted by at least one a group selected from a hydroxyl group, an amino group which may be substituted by a C1-C4 alkyl group and a C1-C6 alkoxy group, and W represents -CO-, -NH-, -S-, -SS-, an alkylene group of which at least one methylene group may be replaced by -O-, or an alkenylene group of which at least one methylene group may be replaced by -O-, and an ammonium hydroxide quaterna represented by the following formula:
    in which R 17, R 18, R 19 and R 20 independently represent an alkyl group, a cycloalkyl group or an aryl group and the alkyl, cycloalkyl and aryl groups may be substituted with at least one group chosen from a hydroxyl group, an amino group which may be substituted by a C1-C4 alkyl group and a C1-C6 alkoxy group, the alkyl group of R11, R12, R13, R14, R15, R16, R17, R18, R19 and R20 preferably has from 1 to 10 carbon atoms. carbon and, more preferably, about 1 to 6 carbon atoms.
    Examples of the amino group which may be substituted by the C 1 -C 4 alkyl group include amino, methylamino, ethylamino, n-butylamino, dimethylamino and diethylamino groups. Examples of the C1-C6 alkoxy group which may be substituted by the C1-C6 alkoxy group include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, tert-butoxy, n-pentyloxy, n -hexyloxy and 2-methylethoxy.
    As specific examples of the alkyl group which may be substituted by at least one group selected from a hydroxyl group, an amino group which may be substituted by a C 1 -C 4 alkyl group, and a C 1 -C 6 alkoxy group which may be substituted by a C1-C6 alkoxy group, there may be mentioned the methyl, ethyl, n-propyl, isopropyl, n-butyl, tert-butyl, n-pentyl, n-hexyl, n-octyl, n-nonyl and n-decyl groups; 2- (2-methoxyethoxy) ethyl, 2-hydroxyethyl, 2-hydroxypropyl, 2-aminoethyl, 4-aminobutyl and 6-aminohexyl.
    The cycloalkyl group of R 11, R 12, R 13, R 14, R 15, R 16, R 17, R 18, R 19 and R 20 preferably has about 5 to 10 carbon atoms. Specific examples of the cycloalkyl group which may be substituted by at least one group selected from a hydroxyl group, an amino group which may be substituted by a C 1 -C 4 alkyl group and a C 1 -C 6 alkoxy group include a cyclopentyl, cyclohexyl group. , cycloheptyl or cyclooctyl.
    The aryl group of R 11, R 12, R 13, R 14, R 15, R 16, R 17, R 18, R 19 and R 20 preferably has about 6 to 10 carbon atoms. Specific examples of the aryl group which may be substituted by at least one group selected from hydroxyl group, an amino group which may be substituted by a C 1 -C 4 alkyl group and a C 1 -C 6 alkoxy group include a phenyl group and a naphthyl group.
    The alkoxy group at R 13, R 14 and R 15 preferably has from 1 to 6 carbon atoms and may be mentioned as specific examples methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, tert-butoxy, n-pentyloxy groups. and n-hexyloxy.
    The alkylene and alkenylene groups of W preferably have 2 to 6 carbon atoms. As specific examples of the alkylene group, mention may be made of the ethylene, trimethylene, tetramethylene, methylenedioxy and ethylene-1,2-dioxy groups and specific examples of the alkenylene group include an ethane-1,2-diyl, 1-propene-1 group. , 3-diyl and 2-butene-1,4-diyl.
    Specific examples of the amine compound include the following: n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, n-decylamine, aniline, 2-methylaniline, 3-methylaniline, 4-methylaniline, 4 nitroaniline, 1-naphthylamine, 2-naphthylamine, ethylenediamine, tetramethylenediamine, hexamethylenediamine, 4,4'-diamino-1,2-diphenylethane, 4,4'-diamino-3,3'-dimethyldiphenylmethane, 4,4 ' 1,4-diamino-3,3'-diethyldiphenylmethane, dibutylamine, dipentylamine, dihexylamine, diheptylamine, dioctylamine, dinonylamine, didecylamine, N-methylaniline, piperidine, diphenylamine, triethylamine, trimethylamine, tripropylamine, tributylamine, tripentylamine, trihexylamine, triheptylamine, trioctylamine, trinonylamine, tridecylamine, methyldibutylamine, methyldipentylamine, methyldihexylamine, methyldicyclohexylamine, methyldiheptylamine, methyldioctylamine, methyl-didonylamine, methyldidecylamine, ethyldibutylamine, ethyldipentylamine, ethyldihexylamine ethyldiheptylamine, ethyldioctylamine, ethyldinonylamine, ethyldidecylamine, dicyclohexylmethylamine, tris [2- (2-methoxyethoxy) ethyl] amine, triisopropanolamine, N, N-dimethylaniline, 2,6-diisopropylaniline, imidazole, benzimidazole, pyridine, 4-methylpyridine, 4-methylimidazole, bipyridine, 2,2'-dipyridylamine, di-2-pyridylketone, 1,2-di (2-pyridyl) ethane, 1,2-di (4-pyridyl) ethane, 1,3-di (4-pyridyl) propane, 1,2-bis (2-pyridyl) ethylene, 1,2-bis (4-pyridyl) ethylene, 1,2-bis (4-pyridyloxy) ethane, 4,4'-sulfide dipyridyl, 4,4'-dipyridyl disulfide, 1 / 2- bis (4-pyridyl) ethylene, 2,2'-dipicolylamine and 3,3'-dipicolylamine.
    Examples of the quaternary ammonium hydroxide include tetramethylammonium hydroxide, tetrabutylammonium hydroxide, tetrahexylammonium hydroxide, tetraoctylammonium hydroxide, phenyltrimethylammonium hydroxide, hydroxide, and the like. (3-trifluoromethylphenyl) trimethylammonium and (2-hydroxyethyl) trimethylammonium hydroxide (also referred to as "choline").
    A hindered amine compound having a piperidine backbone as disclosed in JP 11-52575 A1 can also be used as an extinguishing agent.
    In terms of pattern formation having a higher resolution, the quaternary ammonium hydroxide is preferably used as an extinguishing agent.
    When the basic compound is used as an extinguishing agent, the present resist composition preferably comprises 0.01 to 1% by weight of the basic compound relative to the total amount of the resin component, salt (I) and salt (II).
    The present resist composition may contain, if necessary, a small amount of various additives, such as a sensitizer, a solution-suppressing agent, other polymers, a surfactant, a stabilizer and a dye as long as the effect of the present invention is not prevented.
    The present resist composition is usually in the form of a liquid resist composition, wherein the aforementioned ingredients are dissolved in a solvent and the liquid resist composition is applied to a substrate, such as a silicon wafer, by a conventional method, such as spin coating. The solvent used is sufficient to dissolve the aforementioned ingredients, has a suitable drying rate and gives a uniform and smooth coating after evaporation of the solvent. Solvents generally used in the art may be employed.
    Examples of solvents include a glycol ether ester, such as ethyl cellosolve acetate, methyl cellosolve acetate and propylene glycol monomethyl ether acetate; an acyclic ester, such as ethyl lactate, butyl acetate, amyl acetate and ethyl pyruvate; a ketone, such as acetone, methyl isobutyl ketone, 2-heptanone and cyclohexanone; and a cyclic ester, such as γ-butyrolactone. These solvents can be used alone and two or more can be mixed for use.
    A resist film applied to the substrate, then dried, is subjected to a pattern exposure, then heat-treated to facilitate a deblocking reaction, and then developed with an alkaline developer. The alkaline developer used may be any of a variety of aqueous alkali solutions used in the art. In general, an aqueous solution of tetramethylammonium hydroxide or 2-hydroxyethyl (trimethylammonium) hydroxide (commonly known as "choline") is often used.
    It will be understood that the embodiments disclosed herein are examples in all respects and are not restrictive. It is contemplated that the object of the present invention is determined not by the foregoing descriptions, but by the appended claims, and include all variants of equivalent meanings and ranges in the claims.
    The present invention will be more specifically described by way of examples, which are not intended to limit the scope of the present invention. The terms "%" and "part (s)" used to represent the content of any component and the amount of any material used in the following Examples and Comparative Examples are by weight unless otherwise indicated. The weight average molecular weight of any material used in the following examples is a value found by gel permeation chromatography [type HC1-8120GPC column (3 columns): TSK Multipore HXL-M gel, solvent: tetrahydrofuran manufactured by Tosoh Corporation] using styrene as a standard reference material. The structures of the compounds were determined by NMR (type GX-270 or EX-270 type, manufactured by JEOL Ltd.) and mass spectrometry (liquid chromatography type 1100, manufactured by AGILEND TECHNOLOGIES Ltd., mass spectrometry: LC / MSD type or LC / MSDTOF type, manufactured AGILENT TECHNOLOGIES Ltd.).
    EXAMPLE OF SALT SYNTHESIS 1
    (1) 230 parts of a 30% aqueous sodium hydroxide solution are added to a mixture of 100 parts of methyl difluoro (fluorosulfonyl) acetate and 250 parts of ion exchange water in an ice bath. The resulting mixture is heated and refluxed at 100 ° C for 3 hours. After cooling, the cooled mixture is neutralized with 88 parts of concentrated hydrochloric acid and the resulting solution is concentrated to obtain 164.8 parts of sodium salt of difluorosulfoacetic acid (containing inorganic salt, purity: 62.8%) .
    (2) 5.0 parts of sodium difluorosulfoacetate (purity: 62.8%), 2.6 parts of 4-oxo-1-adamantanol and 200 parts of ethylbenzene are mixed together and 0.8 part of them are added. concentrated sulfuric acid. The resulting mixture is refluxed for 30 hours. After cooling, the mixture is filtered to obtain solids and the solids are washed with tert-butyl methyl ether to obtain 5.5 parts of the salt represented by formula (a) above. Its purity is 35.6%, which has been calculated by the result of 1H-NMR analysis.
    R-NMR (dimethylsulfoxide-d6, internal standard of 2-tetramethylsilane): d (ppm) 1.84 (d, 2H, J = 13.0 Hz), 2.00 (d, 2H, J = 11, 9 Hz), 2.29-2.32 (m, 7H), 2.54 (s, 2H).
    (3) To 5.4 parts of the salt represented by formula (a), which was obtained in (2) (purity: 35.6%), a mixed solvent of 16 parts of acetonitrile and 16 parts was added ion exchange water. To the resulting mixture was added a solution prepared by mixing 1.7 parts of triphenylsulfonium chloride, 5 parts of acetonitrile and 5 parts of ion exchange water. After stirring for 15 hours, the mixture obtained is concentrated and extracted with 142 parts of chloroform. The organic layer obtained is washed with ion exchange water and concentrated. The resulting concentrate is washed with 24 parts of tert-butyl methyl ether and the solvent is decanted to obtain 1.7 parts of the salt represented by the above formula (b) as a white solid, which is referred to as B1.
    1 H-NMR (dimethyl sulphoxide-6δ, internal standard: tetramethylsilane): d (ppm) 1.83 (d, 2H, J = 12.7 Hz), 2.00 (d, 2H, J = 12.0 Hz) ), 2.29-2.32 (m, 7H), 2.53 (s, 2H), 7.75-7.91 (m, 15H) MS (ESI (+) Spectrum): M + 263.2 (m.p. C18H15S + = 263, 09) MS (ESI (-) Spectrum): M-323.0 (C12H13F2O6S- = 323, 04) EXAMPLE OF SALT SYNTHESIS
    (1) 230 parts of a 30% aqueous sodium hydroxide solution are added to a mixture of 100 parts of methyl difluoro (fluorosulfonyl) acetate and 150 parts of ion exchange water in an ice bath . The mixture obtained is refluxed at 100 ° C. for 3 hours. After cooling, the cooled mixture is neutralized with 88 parts of concentrated hydrochloric acid and the resulting solution is concentrated to obtain 164.4 parts of sodium salt of difluorosulfoacetic acid (containing an inorganic salt, purity: 62.7%).
    (2) 1.9 parts of sodium salt of difluorosulfoacetic acid (purity 62.7%), 9.5 parts of N, N-dimethylformamide and 1.0 part of 1,1'-carbonyl diimidazole are mixed and the resulting solution is stirred for 2 hours. The solution is added to a solution prepared by mixing 1.1 parts of the compound represented by the above formula (c), 5.5 parts of N, N-dimethylformamide and 0.2 part of sodium hydride and shaking the mixture. during 2 hours. The resulting solution is stirred for 15 hours to obtain the salt-containing solution represented by the above formula (d).
    (3) 17.2 parts of chloroform and 2.9 parts of aqueous triphenylsulfonium chloride solution are added to the solution containing the salt represented by the above formula (d). The resulting mixture is stirred for 15 hours and then separated into an organic layer and an aqueous layer. The aqueous layer is extracted with 6.5 parts of chloroform to obtain a chloroform layer. The chloroform layer and the organic layer are mixed and washed with ion exchange water. The organic layer obtained is concentrated. The resulting residue is mixed with 5.0 parts of tert-butyl methyl ether and the resulting mixture is filtered to obtain 0.2 part of the salt represented by formula (e) above as a white solid which is referred to as B2.
    1 H-NMR (dimethyl-6-sulfoxide, internal standard: tetramethylsilane): d (ppm) 1.38-1.51 (m, 12H), 2.07 (s, 2H), 3.85 (s, 2H) , 4.41 (s, 1H), 7.75-7.89 (m, 15H) MS (ESI (+) Spectrum): M + 263, 07 (C18H15S + = 263, 09) MS (ESI (-) Spectrum) M-339, 10 (C13H17F2O6S- = 339, 07) EXAMPLE OF SALT SYNTHESIS
    (1) 460 parts of a 30% aqueous sodium hydroxide solution are added to a mixture of 200 parts of methyl difluoro (fluorosulfonyl) acetate and 300 parts of ion exchange water in an ice bath . The resulting mixture is refluxed at 110 ° C for 2.5 hours. After cooling, the cooled mixture is neutralized with 175 parts of concentrated hydrochloric acid and the resulting solution is concentrated to obtain 328.19 parts of the sodium salt of difluorosulfoacetic acid (containing an inorganic salt, purity: 62.8%) .
    (2) 75.1 parts of p-toluenesulfonic acid are added to a mixture of 123.3 parts of the sodium salt of difluorosulfoacetic acid (purity: 62.8%), 65.7 parts of adamantanemethanol and 600 parts of dichloroethane, and the resulting mixture is refluxed for 12 hours. The mixture is concentrated to remove the dichloroethane and 400 parts of tert-butyl methyl ether are added to the resulting residue. The resulting mixture is stirred and filtered to obtain a solid. 400 parts of acetonitrile are added to the solid and the mixture obtained is stirred and filtered to obtain the solid and the filtrate. The filtrates obtained are mixed and concentrated to obtain 99.5 parts of the salt represented by formula (f) above.
    (3) 5.0 parts of thioanisole are dissolved in 15.0 parts of acetonitrile. 8.35 parts of silver perchlorate (I) are added thereto, followed by 11.4 parts of a solution of acetonitrile containing 5.71 parts of methyl iodide. The. The mixture obtained is stirred for 24 hours, the precipitate is filtered to remove it and the filtrate is concentrated. The concentrate is mixed with. 36.8 parts of tert-butyl methyl ether and the resulting mixture is stirred and filtered to obtain 8.22 parts of dimethylphenylsulfonium perchlorate as a white solid.
    (4) 5.98 parts of the salt represented by formula (f) above, obtained in (2) above, are mixed with 35.9 parts of chloroform. To the resulting mixture is added a solution obtained by mixing 4.23 parts of dimethylphenylsulfonium perchlorate obtained in (3) above with 12.7 parts of ion exchange water. The mixture obtained is stirred for 4 hours and then separated into an organic layer and an aqueous layer. The aqueous layer is extracted with 23.9 parts of chloroform to obtain a chloroform layer. The organic layer and the chloroform layer are mixed and washed with ion exchange water until the aqueous layer obtained is neutralized, the whole being then concentrated. The resulting concentrate is mixed with 31.8 parts of tert-butyl methyl ether and the resulting mixture is filtered to obtain 5.38 parts of the salt represented by the above formula (g) as a white solid, which is referred to as B3.
    1H-NMR (dimethylsulfoxide-d6, internal standard: tetramethylsilane): 3 (ppm) 1.51 (d, 6H), 1.62 (dd, 6H), 1.92 (s, 3H), 3.26 (s, 6H), 3.80 (s, 2H), 7.68-7.80 (m, 3H), 8.03-8.06 (m, 2H) MS (ESI (+) Spectrum): M + 193.0 (C8HnS + = 139.06) MS (ESI (-) Spectrum): M-323.0 (C13H17F2O5S- = 232.08) EXAMPLE OF SALT SYNTHESIS
    (1) 32.8 parts of the salt represented by the above-mentioned formula (f), which was obtained according to a similar process described in the salt synthesis examples 3 (1) and (2) mentioned above, are dissolved in 100 parts of ion exchange water. To the resulting solution was added a solution prepared by mixing 28.3 parts of triphenylsulfonium chloride and 140 parts of methanol which was stirred for 15 hours. The resulting mixture is concentrated. The residue obtained is extracted twice with 200 parts of chloroform. The organic layers obtained are mixed and repeatedly washed with ion exchange water until the aqueous layer obtained is neutralized. The solution obtained is concentrated. 300 parts of tert-butyl methyl ether are added to the concentrate and the mixture is stirred. The resulting mixture is filtered and the resulting solid is dried to give 39.7 parts of the salt represented by the above formula (h) as a white solid, which is referred to as B4.
    1H-NMR (dimethylsulfoxide-d6, internal standard: tetramethylsilane): 3 (ppm) 1.52 (d, 6H), 1.63 (dd, 6H), 1.93 (s, 3H), 3.81 (s, 2H), 7.76-7.90 (m, 15H) MS (ESI (+) Spectrum): M + 263.2 (C18H15S + = 263, 09) MS (ESI (-) Spectrum): M-323 (CisH 2 FsO 5 S = 323.08) EXAMPLE OF SALT SYNTHESIS
    5.0 parts of 1- (2-oxo-2-phenylethyl) tetrahydrothiophenium bromide, 50 parts of acetonitrile and 2.5 parts of water are mixed. To the resulting mixture, 7.1 parts of silver monofluorobutanesulfonate and 21.3 parts of acetonitrile are added dropwise with stirring and the resulting mixture is stirred at room temperature for 4 hours. The mixture is filtered to remove the silver bromide and the filtrate obtained is concentrated. The residue obtained is dissolved in mixed solvents of ethyl acetate and tert-butyl methyl ether and crystallized to obtain 6.8 parts of 1- (2-oxo-2-phenylethyl) tetrahydrothiophenium nonafluoro-butanesulfonate, which is called Cl .
    EXAMPLE OF SALT SYNTHESIS 6
    3.0 parts of 1- (2-oxo-2-phenylethyl) tetrahydrothiophenium bromide and 120 parts of acetonitrile are mixed. To the resulting mixture was added 5.6 parts of potassium heptadecafluorooctanesulfonate and the resulting mixture was stirred at room temperature for 24 hours. The mixture is filtered to remove the precipitated potassium bromide and the filtrate obtained is concentrated. The residue obtained is mixed with 50 parts of chloroform and the mixture obtained is stirred at room temperature for 16 hours. The mixture is filtered and the filtrate obtained is mixed with 200 parts of chloroform. The solution obtained is washed with water and concentrated. The concentrated liquid obtained is added dropwise to tert-butyl methyl ether and the precipitated solid is filtered and dried to obtain 4.7 parts of 1- (2-oxo-2-phenylethyl) tetrahydrothiophenium heptadecafluorooctanesulfonate, which is called C2.
    EXAMPLE OF SALT SYNTHESIS 7
    23.7 parts of 1- (2-oxo-2-phenylethyl) tetrahydrothiophenium bromide are dissolved in 236.9 parts of chloroform. To the resulting solution, 15.0 parts of pentafluoroethanesulphonic acid are added dropwise and the resulting mixture is stirred at room temperature overnight.
    79.0 parts of ion exchange water are added to the reaction mixture and the resulting mixture is stirred, then separated into an organic layer and an aqueous layer. The white solid is precipitated in the organic layer and the precipitate is filtered. The precipitate obtained is dissolved in 13.8 parts of acetonitrile. The solution obtained is added dropwise to 207.1 parts of tert-butyl methyl ether. The white precipitate is filtered and dried to obtain 21.9 parts of 1- (2-oxo-2-phenylethyl) -tetrahydrothiophenium pentafluoroethanesulfonate, which is called C3.
    1H-NMR (dimethyl-d6-sulfoxide, internal standard: tetramethylsilane): 3 (ppm) 2.17-2.33 (m, 4H), 3.47- 3.63 (m, 4H), 5.30 ( s, 2H), 7.62 (t, 2H, J = 7.8 Hz), 7.73-7.80 (m, 1H), 8.00 (dd, 2H, J = 1.2 Hz, , 2Hz) 19F-NMR (dimethylsulfoxide-d6, Internal standard: hexafluorobenzene): 3 (ppm) -118.96 (s, 2F), -79.89 (s, 3F).
    EXAMPLE OF SALT SYNTHESIS 8
    (1) 6.6 parts of tetrahydrothiophene are added dropwise to a mixture of 14.9 parts of phenacyl bromide and 75 parts of acetone. The resulting mixture is stirred at room temperature for 18 hours. The precipitate is filtered, washed with 80 parts of a mixed solvent of tert-butyl methyl ether and acetone (quantitative ratio = 1/1), washed again with 50 parts of tert-butyl methyl ether and dried to obtain 16.9 parts of bromide. 1- (2-oxo-2-phenylethyl) tetrahydrothiophenium.
    (2) 2.62 parts of potassium trifluoromethanesulfonate are added to a mixture of 4.00 parts of 1- (2-oxo-2-phenylethyl) -tetrahydrothiophenium bromide, which is obtained in (1) above and 160 parts of acetonitrile. The resulting mixture is stirred at room temperature for 18 hours. The precipitated potassium bromide is removed by filtration and the filtrate obtained is concentrated. 150 parts of chloroform are added to the filtrate obtained and the resulting mixture is stirred at room temperature for 16 hours. The mixture is filtered to remove insolubles and the resulting filtrate is concentrated. 22 parts of acetone are added to the residue and the resulting mixture is stirred and filtered to remove insoluble materials. The filtrate obtained is concentrated. The residue is mixed with a mixed solvent of acetone and ethyl acetate and the recrystallization is carried out to obtain 3,41 parts of 1- (2-oxo-2-phenylethyl) tetrahydrothiophenium trifluoromethanesulfonate, which is named C4.
    1H-NMR (dimethylsulfoxide-d6, internal standard: tetramethylsilane): d (ppm) 2.16-2.32 (m, 4H), 3.46- 3.64 (m, 4H), 5.31 ( s, 2H), 7.63 (m, 2H), 7.77 (m, 1H), 8.00 (m, 2H) EXAMPLE OF RESIN SYNTHESIS 1
    The monomers used in this resin synthesis example are the following monomers M1, M2 and M3:
    The monomer M1, the monomer M2 and the monomer M3 are dissolved in a quantity of methyl isobutyl ketone of twice the amount of all the monomers to be used (molar ratio of monomers: monomer M1: monomer M2: monomer M3 = 5: 2.5: 2.5). 2,2'-azobisisobutyronitrile is added to the solution as an initiator in a ratio of 2 mol% to the total molar amount of all the monomers and the resulting mixture is heated at 80 ° C for about 8 hours. The reaction solution is poured into a large amount of heptane to cause precipitation. The precipitate is isolated and washed twice with a large amount of heptane to provide purification. As a result, a copolymer having a weight average molecular weight of about 9200 is obtained. This copolymer has the following structural units. These are called Al resins.
    EXAMPLE OF SYNTHESIS OF RESIN 2
    The monomers used in this resin synthesis example are the following monomers M1, M2 and M4:
    The monomer M1, the monomer M2 and the monomer M4 are dissolved in a quantity of 1,4-dioxane of 1.28 times the amount of all the monomers to be used (molar ratio of monomers: monomer M1: monomer M2: monomer M4 = 50:25:25). To the solution, 2,2'-azobisisobutyronitrile is added as an initiator in the ratio of 3 mol% to the total molar amount of the monomers. The resulting solution is added to a quantity of 1,4-dioxane of 0.72 times the amount of all the monomers to be used at 88 ° C for 2 hours. The resulting mixture is stirred at the same temperature for 5 hours. The reaction mixture is cooled and then poured into a large amount of a mixed solvent of methanol and water to precipitate. The precipitate is isolated and washed twice with a large amount of methanol to effect purification. As a result, a copolymer having a weight average molecular weight of about 8500 is obtained. This copolymer has the following structural units which are referred to as A2 resins:
    EXAMPLES 1 TO 8 AND COMPARATIVE EXAMPLES 1 TO 4 Acid Generators B1 Acid Generator
    B2 Acid Generator
    B3 acid generator
    B4 acid generator
    Cl acid generator
    C2 Acid Generator
    C3 acid generator
    C4 acid generator
    Resins Resins Al and A2
    Extinguishing agent Q1: 2,6-diisopropylaniline
    Solvents Y1: propylene glycol monomethyl ether acetate 145 parts 2-heptanone 20.0 parts propylene glycol monomethyl ether 20.0 parts γ-butyrolactone 3.5 parts
    The following components are mixed and dissolved, and then filtered through a fluorinated resin filter having a pore diameter of 0.2 μm to prepare a liquid resist: Resin (type and amount are described in Table I) Acid Generator ( type and quantity are described in Table I)
    Extinguishing agent (type and quantity are described in Table I)
    Solvent (the type is described in Table I)
    Silicon wafers are each coated with "ARC-29A" which is an organic antireflective coating composition available from Nissan Chemical Industries, Ltd., and then fired under the following conditions: 205 ° C, 60 seconds, to form a anti-reflective organic coating with a thickness of 780 Â. Each of the resist liquids prepared as above is rotated on the anti-reflective coating so that the resulting film thickness becomes 0.15 μm after spraying. The silicon wafers thus coated with the respective resist liquids are each precooked on a direct hot plate and at a temperature shown in column "PB" of Table I for 60 seconds. Using an ArF excimer stepper system ("FPA-5000AS3" manufactured by Canon Inc., NA = 0.75, 2/3 annular), each wafer thus formed with the respective resist film is subjected to exposure of a pattern of lines and spaces whose amount of exposure is changed step by step.
    After exposure, each slice is subjected to post-exposure baking on a hot plate at a temperature shown in the "PEB" column of Table I for 60 seconds, followed by stirring for 60 seconds with an aqueous solution. of tetramethylammonium hydroxide at 2.38% by weight.
    Each of the dark field patterns grown on the antireflective organic coating substrate after development was observed with a scanning electron microscope, and the results are shown in Table II. The term "dark field pattern" as used herein refers to a pattern obtained by exposure and development through a reticle comprising a chromium base surface (photo-protection portion) and glass layers. linear (light transmitting portion) formed in the chromium surface and aligned with each other. In this way, the dark field pattern is such that, after exposure and development, the resist layer surrounding the pattern of lines and spaces remains on the substrate.
    Effective Sensitivity (ES): It is expressed as the amount of exposure that causes the line pattern and gap pattern to become 1: 1 after exposure through a pattern mask of 100 nm lines and spaces and development.
    Line edge roughness (LER): Each wall surface of a pattern developed on the organic anti-reflective coating substrate after development is observed with a scanning electron microscope. When the surface of the wall is the same as that of Comparative Example 1, its evaluation is marked by "Δ", when the surface of the wall is smoother than that of Comparative Example 1, its evaluation is marked by "O" and, when the surface of the wall is rougher than that of Comparative Example 1, its evaluation is marked by "X".
    Table I
    Table II
    As shown in Table II, the resist compositions of the examples according to the present invention provide a good resist configuration for resolution and smoothing of the wall surface.
    The present composition provides a good resist pattern in terms of resolution and roughness of the line edges and is particularly suitable for laser lithography. ArF excimer, KrF excimer laser lithography and ArF immersion lithography.
    权利要求:
    Claims (21)
    [1]
    A chemically amplified resist composition comprising: (A) a salt represented by formula (I):

    [2]
    A chemically amplified resist composition according to claim 1, wherein A + is a cation represented by the formula (Id), (Ic) or (If):

    [3]
    A chemically amplified resist composition according to claim 1, wherein A is a cation represented by the formula (Ig):

    [4]
    The chemically amplified resist composition of claim 1, wherein A + is a cation represented by the formula (Ih):

    [5]
    The chemically amplified resist composition according to claim 1, wherein R represents a group represented by the formula:

    [6]
    The chemically amplified resist composition of claim 5, wherein the group represented by the formula:

    [7]
    The chemically amplified resist composition of claim 1, wherein A + is a cation represented by the formula (Ih):

    [8]
    The chemically amplified resist composition of claim 7, wherein the group represented by the formula:

    [9]
    9. Chemically amplified resist composition according to claim 1, wherein Q1 and Q2 each independently represent a fluorine atom or a trifluoromethyl group.
    [10]
    The chemically amplified resist composition of claim 1, wherein Q1 and Q2 are fluorine atoms.
    [11]
    The chemically amplified resist composition according to claim 1, wherein P and P7 are linked to form a divalent C3-C12 acyclic hydrocarbon group which forms a ring together with the adjacent S +, P8 represents a hydrogen atom and P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted by at least one group chosen from a C1-C6 alkoxy group, a C2-C20 acyl group and a nitro group; .
    [12]
    A chemically amplified resist composition according to claim 1, wherein P6 and P7 are linked to form a tetramethylene moiety which forms a ring together with the adjacent S +, P8 represents a hydrogen atom and P9 represents a C1-C6 alkyl group. C12, a C3-C12 cycloalkyl group or an aromatic group which may be substituted by at least one group selected from a C1-C6 alkoxy group, a C2-C20 acyl group and a nitro group.
    [13]
    13. The chemically amplified resist composition according to claim 1, wherein Q3 represents a C1-Cb perfluoroalkyl group.
    [14]
    A chemically amplified resist composition according to claim 1, wherein Q3 represents a C1-C8 perfluoroalkyl group, P6 and P7 are linked to form a divalent C3-C12 acyclic hydrocarbon group which forms a ring together with the adjacent S +, P8 represents a hydrogen atom and P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted by at least one group selected from a C1-C6 alkoxy group, a group C2-C20 acyl and a nitro group.
    [15]
    15. A chemically amplified resist composition according to claim 1, wherein Q3 represents a C1-C6 perfluoroalkyl group, P6 and P7 are linked to form a tetramethylene moiety which forms a ring together with the adjacent S +, P8 represents an atom of hydrogen, P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted by at least one group chosen from a C3-C6 alkoxy group and a C2-C20 acyl group; and a nitro group.
    [16]
    The chemically amplified resist composition of claim 1, wherein A + is a cation represented by the formula (Ih):

    [17]
    17. Chemically amplified resist composition according to claim 1, wherein the quantitative ratio of the salt represented by the formula (I) to the salt represented by the formula (II) is 9/1 to 1/9.
    [18]
    The chemically amplified resist composition of claim 1, wherein the resin contains a structural unit derived from a monomer having a bulky acid unstable moiety.
    [19]
    The resist composition of claim 18, wherein the acid-labile large moiety is a 2-alkyl-2-adamantyl ester moiety or a 1- (1-adamantyl) -1-alkyl alkyl ester moiety.
    [20]
    The resist composition of claim 18, wherein the monomer having an acid-labile large moiety is 2-alkyl-2-adamantyl acrylate, 2-alkyl-2-adamantyl methacrylate, acrylate of 1 - (1-adamantyl) -1-alkylalkyl, 1- (1-adamantyl) -1-alkylalkyl methacrylate, 2-alkyl-2-adamantyl 5-norbormene-2-carboxylate, 5-norbormene-2- 1- (1-adamantyl) -1-alkylalkyl carboxylate, 2-alkyl-2-adamantyl alpha-chloroacrylate or 1- (1-adamantyl) -1-alkylalkyl alpha-chloroacrylate.
    [21]
    The resist composition of claim 1, wherein the resist composition further comprises a basic compound.
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    法律状态:
    2014-06-30| RE| Patent lapsed|Effective date: 20131231 |
    优先权:
    申请号 | 申请日 | 专利标题
    JP2006351843|2006-12-27|
    JP2006351843|2006-12-27|
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